Epitaxial silicon films deposited at high rates by gas-jet electron beam plasma CVD
| Autor: | Sharafutdinov, R.G., Karsten, V.M., Khmel, S.Ya. *, Cherkov, A.G., Gutakovskii, A.K., Pokrovsky, L.D., Semenova, O.I. |
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| Zdroj: | In Surface & Coatings Technology 2003 174:1178-1181 |
| Databáze: | ScienceDirect |
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