Deposition of carbon nitride films by an electron-beam-excited plasma sputtering method

Autor: Ban, Masahito *, Hasegawa, Takeshi, Goto, Akiko, Dake, Yoshinori, Kakudate, Yozo
Zdroj: In Surface & Coatings Technology 2003 169:332-335
Databáze: ScienceDirect