Ion bombardment and temperature effects on the microstructure of RF plasma chemical vapor-deposited SiC:H
| Autor: | Thomas, L. *, Ducarroir, M., Hillel, R., Berjoan, R. |
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| Zdroj: | In Surface & Coatings Technology 2001 142:829-834 |
| Databáze: | ScienceDirect |
| Externí odkaz: |
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