Characteristics of BF 3 plasma-doped gate/source/drain for 0.18-μm pMOSFETs
| Autor: | Ha, Jung-Min *, Park, Jung-Woo, Felch, Susan, Fujihara, Kazuyuki, Kang, Ho-Kyu, Lee, Sang-In |
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| Zdroj: | In Surface & Coatings Technology 2001 136(1):157-161 |
| Databáze: | ScienceDirect |
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Full Text from ScienceDirect