Investigations on TaHf alloys for thin film resistor applications

Autor: Wang, Kao-Yuan, Chang, Ting-Chang, Chen, Wen-Chung, Zhang, Yong-Ci, Tseng, Yi-Ting, Yang, Chih-Cheng, Lin, Chun-Chu, Wu, Pei-Yu, Tan, Yung-Fang, Tsai, Tsung-Ming
Zdroj: In Materials Chemistry and Physics 1 June 2022 285
Databáze: ScienceDirect