Investigations on TaHf alloys for thin film resistor applications
Autor: | Wang, Kao-Yuan, Chang, Ting-Chang, Chen, Wen-Chung, Zhang, Yong-Ci, Tseng, Yi-Ting, Yang, Chih-Cheng, Lin, Chun-Chu, Wu, Pei-Yu, Tan, Yung-Fang, Tsai, Tsung-Ming |
---|---|
Zdroj: | In Materials Chemistry and Physics 1 June 2022 285 |
Databáze: | ScienceDirect |
Externí odkaz: |