Reactive sputtered TiXNbYNZ thin films. I. Basic processing relationships
| Autor: | Sheppard, L.R., Zhang, H., Liu, R., Macartney, S., Murphy, T., Wuhrer, R. |
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| Zdroj: | In Materials Chemistry and Physics 15 February 2019 224:308-313 |
| Databáze: | ScienceDirect |
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