Radio frequency plasma deposited boron doped high conductivity p-type nano crystalline silicon oxide thin film for solar cell window layer

Autor: Shin, Chonghoon, Iftiquar, S.M., Park, Jinjoo, Ahn, Shihyun, Kim, Sangho, Jung, Junhee, Bong, Sungjae, Yi, Junsin
Zdroj: In Materials Chemistry and Physics 1 June 2015 159:64-70
Databáze: ScienceDirect