Annealing temperature dependence of interface characteristic and energy-band alignment in ultra-thin HfLaO/Si and HfLaO/SiGe interfaces
| Autor: | Yang, Y., Jin, C.G., Wu, Z.F., Wu, X.M., Zhuge, L.J., Yu, T. |
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| Zdroj: | In Materials Chemistry and Physics 15 November 2013 142(2-3):479-483 |
| Databáze: | ScienceDirect |
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