Stoichiometric SiO 2 thin films deposited by reactive sputtering
| Autor: | Radović, I., Serruys, Y., Limoge, Y., Bibić, N., Poissonnet, S., Jaoul, O., Mitrić, M., Romčević, N., Milosavljević, M. |
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| Zdroj: | In Materials Chemistry and Physics 2007 104(1):172-176 |
| Databáze: | ScienceDirect |
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