Atomistic comparative study of VUV photodeposited silicon nitride on InP(100) by simulation and atomic force microscopy
| Autor: | Flicstein, J. *, Guillonneau, E., Marquez, J., How Kee Chun, L.S., Maisonneuve, D., David, C., Wang, Zh., Palmier, J.F., Courant, J.L. |
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| Zdroj: | In Applied Surface Science 2000 154:337-344 |
| Databáze: | ScienceDirect |
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