Interhalogen plasma chemistries for dry etch patterning of Ni, Fe, NiFe and NiFeCo thin films

Autor:	Cho, H a, *, Jung, K.B a, Hays, D.C a, Hahn, Y.B a, Lambers, E.S a, Feng, T a, Park, Y.D a, Childress, J.R b, Pearton, S.J a
Zdroj:	In Applied Surface Science 1999 140(1):215-222
Databáze:	ScienceDirect
Externí odkaz:	Zobrazit plný text záznamu Full Text from ScienceDirect