Plasma immersion ion implantation for shallow junctions in silicon
Autor: | Pintér, I a, *, Abdulhadi, A.H a, Makaró, Zs a, Khanh, N.Q a, Ádám, M a, Bársony, I a, Poortmans, J b, Sivoththaman, S b, Song, Hai-Zhi c, Adriaenssens, G.J c |
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Zdroj: | In Applied Surface Science 1999 138:224-227 |
Databáze: | ScienceDirect |
Externí odkaz: |