Plasma immersion ion implantation for shallow junctions in silicon

Autor: Pintér, I a, *, Abdulhadi, A.H a, Makaró, Zs a, Khanh, N.Q a, Ádám, M a, Bársony, I a, Poortmans, J b, Sivoththaman, S b, Song, Hai-Zhi c, Adriaenssens, G.J c
Zdroj: In Applied Surface Science 1999 138:224-227
Databáze: ScienceDirect