The crucial influence of Al on the high-temperature oxidation resistance of Ti1-xAlxBy diboride thin films (0.36 ≤ x ≤ 0.74, 1.83 ≤ y ≤ 2.03)
| Autor: | Wicher, Bartosz a, b, ⁎, Rogoz, Vladyslav a, Lu, Jun a, Kulikowski, Krzysztof b, Lachowski, Artur c, Kolozsvári, Szilárd d, Polcik, Peter d, Greczynski, Grzegorz a |
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| Zdroj: | In Applied Surface Science 30 March 2025 686 |
| Databáze: | ScienceDirect |
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