Plasma-enhanced atomic layer deposition of carbon films employing a cyclic process of N2/H2 plasma and α, α’-dichloro-p-xylene as a precursor
| Autor: | Hu, Liugang, Tsutsumi, Takayoshi, Kobayashi, Nobuyoshi, Ishikawa, Kenji, Hori, Masaru |
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| Zdroj: | In Applied Surface Science 1 February 2025 681 |
| Databáze: | ScienceDirect |
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