Plasma atomic layer etching of ruthenium by oxygen adsorption-removal cyclic process
| Autor: | Kim, Doo San, Kwon, Hae In, Jang, Yun Jong, Kim, Gyoung Chan, Gil, Hong Seong, Kim, Dae Whan, Jeong, Byeong Hwa, Yeom, Geun Young |
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| Zdroj: | In Applied Surface Science 15 October 2024 670 |
| Databáze: | ScienceDirect |
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