Area-selective atomic layer deposition (AS-ALD) of low temperature (300 °C) cobalt thin film using octadecyltrichlorosilane (ODTS) self-assembled monolayers (SAMs)
| Autor: | Kim, Chaewon, Choi, Moonsuk, Sim, Jihyun, Kim, Hyungjun, Choi, Changhwan |
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| Zdroj: | In Applied Surface Science 1 August 2024 663 |
| Databáze: | ScienceDirect |
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