Etching mechanism of amorphous hydrogenated silicon nitride by hydrogen fluoride
| Autor: | Khumaini, Khabib, Kim, Yewon, Hidayat, Romel, Chowdhury, Tanzia, Kim, Hye-Lee, Cho, Byungchul, Park, Sangjoon, Lee, Won-Jun |
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| Zdroj: | In Applied Surface Science 1 May 2024 654 |
| Databáze: | ScienceDirect |
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