Boron-doped amorphous carbon deposited by DC sputtering for a hardmask: Microstructure and dry etching properties
| Autor: | Kim, Sungtae, Kim, Ung-gi, Ryu, Jinseok, Kim, Dokyun, Kim, Miyoung, Joo, Young-Chang, Lee, So-Yeon |
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| Zdroj: | In Applied Surface Science 15 November 2023 637 |
| Databáze: | ScienceDirect |
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