Scalable growth of atomically thin MoS2 layers in a conventional MOCVD system using molybdenum dichloride dioxide as the molybdenum source
| Autor: | Yang, Xu, Li, Shisheng, Ikeda, Naoki, Ohtake, Akihiro, Sakuma, Yoshiki |
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| Zdroj: | In Applied Surface Science 1 November 2023 636 |
| Databáze: | ScienceDirect |
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