Inherent selective pulsed chemical vapor deposition of aluminum oxide in nm scale
| Autor: | Cho, Yunil, Huang, James, Zhang, Zichen, Wang, Kesong, Lee, Ping-che, Kim, Chanyoung, Wong, Keith, Nemani, Srinivas, Yieh, Ellie, Kummel, Andrew C. |
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| Zdroj: | In Applied Surface Science 15 June 2023 622 |
| Databáze: | ScienceDirect |
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