Plasma enhanced atomic layer deposition of crystallized gallium phosphide on Si with tri-Ethylgallium and tri-tert-Butylphosphine

Autor: Yun, SeongUk, Kuo, Cheng-Hsuan, Lee, Ping-Che, Ueda, Scott T., Wang, Victor, Kashyap, Harshil, Mcleod, Aaron J., Zhang, Zichen, Winter, Charles H., Kummel, Andrew C.
Zdroj: In Applied Surface Science 15 May 2023 619
Databáze: ScienceDirect