Control of silicon dioxide etching rate in hydrogen microwave plasma by addition of oxygen
| Autor: | Yurov, V.Yu., Bolshakov, A.P., Fedorova, I.A., Popovich, A.F., Zyablyuk, K.N., Altakhov, A.S., Sovyk, D.N., Pivovarov, P.A., Volkov, P.V., Ralchenko, V.G. |
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| Zdroj: | In Applied Surface Science 1 March 2023 612 |
| Databáze: | ScienceDirect |
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