Effect of hydrofluorocarbon structure of C3H2F6 isomers on high aspect ratio etching of silicon oxide
| Autor: | Tak, Hyun Woo, Lee, Hye Joo, Wen, Long, Kang, Byung Jin, Sung, Dain, Bae, Jeong Woon, Kim, Dong Woo, Lee, Wonseok, Lee, Seung Bae, Kim, Keunsuk, Cho, Byeong Ok, Kim, Young Lea, Song, Han Dock, Yeom, Geun Young |
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| Zdroj: | In Applied Surface Science 30 October 2022 600 |
| Databáze: | ScienceDirect |
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