Atomic tailoring of low-thermal-budget and nearly wake-up-free ferroelectric Hf0.5Zr0.5O2 nanoscale thin films by atomic layer annealing

Autor: Chang, Teng-Jan, Jiang, Yu-Sen, Yi, Sheng-Han, Chou, Chun-Yi, Wang, Chin-I, Lin, Hsin-Chih, Chen, Miin-Jang
Zdroj: In Applied Surface Science 30 July 2022 591
Databáze: ScienceDirect