Atomic tailoring of low-thermal-budget and nearly wake-up-free ferroelectric Hf0.5Zr0.5O2 nanoscale thin films by atomic layer annealing
Autor: | Chang, Teng-Jan, Jiang, Yu-Sen, Yi, Sheng-Han, Chou, Chun-Yi, Wang, Chin-I, Lin, Hsin-Chih, Chen, Miin-Jang |
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Zdroj: | In Applied Surface Science 30 July 2022 591 |
Databáze: | ScienceDirect |
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