Effects of fluorine plasma pre-treatment on electrical properties of high-κ-based InP metal-oxide-semiconductor device

Autor: Xu, Qian, Liu, Wei-Dong, Ding, Yao-Xin, Zheng, Zhi-Wei, Ying, Lei-Ying, Zhang, Bao-Ping
Zdroj: In Applied Surface Science 30 May 2022 585
Databáze: ScienceDirect