Effects of fluorine plasma pre-treatment on electrical properties of high-κ-based InP metal-oxide-semiconductor device
Autor: | Xu, Qian, Liu, Wei-Dong, Ding, Yao-Xin, Zheng, Zhi-Wei, Ying, Lei-Ying, Zhang, Bao-Ping |
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Zdroj: | In Applied Surface Science 30 May 2022 585 |
Databáze: | ScienceDirect |
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