Applying the plasma physical sputtering process to SRF cavity treatment: Simulation and Experiment Study
| Autor: | Zhu, Tongtong, Luo, Didi, Wu, Andong, Tan, Teng, Guo, Hao, Xiong, Pingran, Lin, Zeqiang, Huang, Shichun, Chu, Qingwei, Yang, Ziqin, Pan, Feng, Lu, Ming, Zhang, Kun, He, Yuan |
|---|---|
| Zdroj: | In Applied Surface Science 1 February 2022 574 |
| Databáze: | ScienceDirect |
| Externí odkaz: |
|
Full Text from ScienceDirect