Effect of deposition temperature and surface reactions in atomic layer deposition of silicon oxide using Bis(diethylamino)silane and ozone
| Autor: | Roh, Hyeonsu, Kim, Hye-Lee, Khumaini, Khabib, Son, Heeju, Shin, Donggeon, Lee, Won-Jun |
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| Zdroj: | In Applied Surface Science 1 January 2022 571 |
| Databáze: | ScienceDirect |
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