The impact of H2 and N2 on the material properties and secondary electron yield of sputtered amorphous carbon films for anti-multipacting applications
| Autor: | Fernández, H. Moreno, Himmerlich, M., Costa Pinto, P., Coroa, J., Sousa, D., Baris, A., Taborelli, M. |
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| Zdroj: | In Applied Surface Science 15 March 2021 542 |
| Databáze: | ScienceDirect |
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