Electron beam lithography induced doping in multilayer MoTe2

Autor: Luo, Tingyan, Pan, Baojun, Zhang, Kenan, Dong, Youqing, Zou, Chao, Gu, Zhiyang, Zhang, Lijie
Zdroj: In Applied Surface Science 28 February 2021 540 Part 1
Databáze: ScienceDirect