Achieving ultralow surface roughness and high material removal rate in fused silica via a novel acid SiO2 slurry and its chemical-mechanical polishing mechanism
| Autor: | Shi, Xiao-Lei, Chen, Gaopan, Xu, Li, Kang, Chengxi, Luo, Guihai, Luo, Haimei, Zhou, Yan, Dargusch, Matthew S., Pan, Guoshun |
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| Zdroj: | In Applied Surface Science 15 January 2020 500 |
| Databáze: | ScienceDirect |
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