Growth and thermal annealing for acceptor activation of p-type (Al)GaN epitaxial structures: Technological challenges and risks
| Autor: | Zlotnik, Sebastian, Sitek, Jakub, Rosiński, Krzysztof, Michałowski, Paweł P., Gaca, Jarosław, Wójcik, Marek, Rudziński, Mariusz |
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| Zdroj: | In Applied Surface Science 15 September 2019 488:688-695 |
| Databáze: | ScienceDirect |
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