Metal barrier induced damage in self-assembly based organosilica low-k dielectrics and its reduction by organic template residues

Autor: Krishtab, M., de Marneffe, J.-F., Armini, S., Meersschaut, J., Bender, H., Wilson, C., De Gendt, S.
Zdroj: In Applied Surface Science 15 August 2019 485:170-178
Databáze: ScienceDirect