Low temperature epitaxy of high-quality Ge buffer using plasma enhancement via UHV-CVD system for photonic device applications
| Autor: | Alharthi, Bader, Dou, Wei, Grant, Perry C., Grant, Joshua M., Morgan, Timothy, Mosleh, Aboozar, Du, Wei, Li, Baohua, Mortazavi, Mansour, Naseem, Hameed, Yu, Shui-Qing |
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| Zdroj: | In Applied Surface Science 1 July 2019 481:246-254 |
| Databáze: | ScienceDirect |
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