Influence of substrate annealing on inducing Ti3+ and oxygen vacancy in TiO2 thin films deposited via RF magnetron sputtering
| Autor: | Abdullah, S.A., Sahdan, M.Z., Nafarizal, N., Saim, H., Embong, Z., Cik Rohaida, C.H., Adriyanto, F. |
|---|---|
| Zdroj: | In Applied Surface Science 31 December 2018 462:575-582 |
| Databáze: | ScienceDirect |
| Externí odkaz: |
|
Full Text from ScienceDirect