Comparative investigation of Si-C-N Films prepared by plasma enhanced chemical vapour deposition and magnetron sputtering
Autor: | Kozak, A.O., Porada, O.K., Ivashchenko, V.I., Ivashchenko, L.A., Scrynskyy, P.L., Tomila, T.V., Manzhara, V.S. |
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Zdroj: | In Applied Surface Science 15 December 2017 425:646-653 |
Databáze: | ScienceDirect |
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