Comparative investigation of Si-C-N Films prepared by plasma enhanced chemical vapour deposition and magnetron sputtering

Autor: Kozak, A.O., Porada, O.K., Ivashchenko, V.I., Ivashchenko, L.A., Scrynskyy, P.L., Tomila, T.V., Manzhara, V.S.
Zdroj: In Applied Surface Science 15 December 2017 425:646-653
Databáze: ScienceDirect