Oxygen accumulation on metal surfaces investigated by XPS, AES and LEIS, an issue for sputter depth profiling under UHV conditions

Autor: Steinberger, R., Celedón, C.E., Bruckner, B., Roth, D., Duchoslav, J., Arndt, M., Kürnsteiner, P., Steck, T., Faderl, J., Riener, C.K., Angeli, G., Bauer, P., Stifter, D.
Zdroj: In Applied Surface Science 31 July 2017 411:189-196
Databáze: ScienceDirect