Patterning of diamond like carbon films for sensor applications using silicon containing thermoplastic resist (SiPol) as a hard mask

Autor: Virganavičius, D., Cadarso, V.J., Kirchner, R., Stankevičius, L., Tamulevičius, T., Tamulevičius, S., Schift, H.
Zdroj: In Applied Surface Science 1 November 2016 385:145-152
Databáze: ScienceDirect