Patterning of diamond like carbon films for sensor applications using silicon containing thermoplastic resist (SiPol) as a hard mask
Autor: | Virganavičius, D., Cadarso, V.J., Kirchner, R., Stankevičius, L., Tamulevičius, T., Tamulevičius, S., Schift, H. |
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Zdroj: | In Applied Surface Science 1 November 2016 385:145-152 |
Databáze: | ScienceDirect |
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