Thermal post-deposition treatment effects on nanocrystalline hydrogenated silicon prepared by PECVD under different hydrogen flow rates
Autor: | Amor, Sana Ben, Meddeb, Hosny, Daik, Ridha, Othman, Afef Ben, Slama, Sonia Ben, Dimassi, Wissem, Ezzaouia, Hatem |
---|---|
Zdroj: | In Applied Surface Science 1 January 2016 360 Part B:572-578 |
Databáze: | ScienceDirect |
Externí odkaz: |