RF plasma enhanced MOCVD of yttria stabilized zirconia thin films using octanedionate precursors and their characterization

Autor: Chopade, S.S., Nayak, C., Bhattacharyya, D., Jha, S.N., Tokas, R.B., Sahoo, N.K., Deo, M.N., Biswas, A., Rai, Sanjay, Thulasi Raman, K.H., Rao, G.M., Kumar, Niranjan, Patil, D.S.
Zdroj: In Applied Surface Science 15 November 2015 355:82-92
Databáze: ScienceDirect