The effect of nitrogen incorporation in DLC films deposited by ECR Microwave Plasma CVD
Autor: | Seker, Z., Ozdamar, H., Esen, M., Esen, R., Kavak, H. |
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Zdroj: | In Applied Surface Science 30 September 2014 314:46-51 |
Databáze: | ScienceDirect |
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