Deposition of Cr–Si–Ni–Mo films at a low sputtering current and performance of heat and humid resistance
| Autor: | Wang, X.Y., Li, C.G., Ma, J.X., Shao, J.Q. |
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| Zdroj: | In Applied Surface Science 15 January 2014 289:538-544 |
| Databáze: | ScienceDirect |
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