RF plasma MOCVD of Y2O3 thin films: Effect of RF self-bias on the substrates during deposition
| Autor: | Chopade, S.S., Barve, S.A., Thulasi Raman, K.H., Chand, N., Deo, M.N., Biswas, A., Rai, Sanjay, Lodha, G.S., Rao, G.M., Patil, D.S. |
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| Zdroj: | In Applied Surface Science 15 November 2013 285 Part B:524-531 |
| Databáze: | ScienceDirect |
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