Complementary resistive switching mechanism in Ti-based triple TiOx/TiN/TiOx and TiOx/TiOxNy/TiOx matrix

Autor: Lee, Ah Rahm, Bae, Yoon Cheol, Im, Hyun Sik, Hong, Jin Pyo
Zdroj: In Applied Surface Science 1 June 2013 274:85-88
Databáze: ScienceDirect