Influence of the sputtering reactive gas on the oxide and oxynitride La[sbnd]Ti[sbnd]O[sbnd]N deposition by RF magnetron sputtering
| Autor: | Lu, Y., Le Paven-Thivet, C., Benzerga, R., Le Gendre, L., Sharaiha, A., Tessier, F., Cheviré, F. |
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| Zdroj: | In Applied Surface Science 1 January 2013 264:533-537 |
| Databáze: | ScienceDirect |
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