The influences of high energetic oxygen negative ions and active oxygen on the microstructure and electrical properties of ZnO:Al films by MF magnetron sputtering

Autor: Hao, Changshan, Xie, Bin, Li, Ming, Wang, Haiqian, Jiang, Yousong, Song, Yizhou
Zdroj: In Applied Surface Science 1 August 2012 258(20):8234-8240
Databáze: ScienceDirect