Surface photovoltage and Auger electron spectromicroscopy studies of HfO2/SiO2/4H-SiC and HfO2/Al2O3/4H-SiC structures
| Autor: | Domanowska, A., Miczek, M., Ucka, R., Matys, M., Adamowicz, B., Żywicki, J., Taube, A., Korwin-Mikke, K., Gierałtowska, S., Sochacki, M. |
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| Zdroj: | In Applied Surface Science 15 August 2012 258(21):8354-8359 |
| Databáze: | ScienceDirect |
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