Controlling precursor stability and evaporation through molecular design. Pseudo single source precursor approach to MOCVD SrTiO 3 thin films

Autor: Seisenbaeva, Gulaim A., Gohil, Suresh, Kessler, Vadim G., Andrieux, Michel, Legros, Corinne, Ribot, Patrick, Brunet, M., Scheid, E.
Zdroj: In Applied Surface Science 2011 257(6):2281-2290
Databáze: ScienceDirect