Reactive Pulsed Laser Deposition of titanium nitride thin film: Optimization of process parameters using Secondary Ion Mass Spectrometry
| Autor: | Krishnan, R., Mathews, Tom, Balamurugan, A.K., Dash, S., Tyagi, A.K., Raj, Baldev, Jayaram, Vikram |
|---|---|
| Zdroj: | In Applied Surface Science 2010 256(10):3077-3080 |
| Databáze: | ScienceDirect |
| Externí odkaz: |
|
Full Text from ScienceDirect