Effects of total CH 4/Ar gas pressure on the structures and field electron emission properties of carbon nanomaterials grown by plasma-enhanced chemical vapor deposition
| Autor: | Qi, J.L., Wang, X., Zheng, W.T., Tian, H.W., Liu, C., Lu, Y.L., Peng, Y.S., Cheng, G. |
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| Zdroj: | In Applied Surface Science 2009 256(5):1542-1547 |
| Databáze: | ScienceDirect |
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