Study of the surface cleaning of GOI and SGOI substrates for Ge epitaxial growth

Autor: Moriyama, Yoshihiko, Hirashita, Norio, Usuda, Koji, Nakaharai, Shu, Sugiyama, Naoharu, Toyoda, Eiji, Takagi, Shin-ichi
Zdroj: In Applied Surface Science 2009 256(3):823-829
Databáze: ScienceDirect