Study of the surface cleaning of GOI and SGOI substrates for Ge epitaxial growth
Autor: | Moriyama, Yoshihiko, Hirashita, Norio, Usuda, Koji, Nakaharai, Shu, Sugiyama, Naoharu, Toyoda, Eiji, Takagi, Shin-ichi |
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Zdroj: | In Applied Surface Science 2009 256(3):823-829 |
Databáze: | ScienceDirect |
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